Previously we talked about the new IBM’s CBE fabricated using 45-nanometer process technology. The migration effort from 65-nanometer to 45-nanometer is not simple as it involves huge design experience and high technology manufacturing process to achieve this. With the design tool introduced by IBM, the design complexity can be further reduced with the assistance of this advanced layout tool which automates some of the transition … Continue reading IBM’s Automated Layout Tool to Convert 65-nm to 45-nm Silicon Design